Temporary grating coupler structures using localised refractive index engineering
Temporary grating coupler structures using localised refractive index engineering
We demonstrate an erasable grating coupler which allows optical device testing throughout the fabrication process without impairing final circuit performance. Refractive index variation is introduced using ion implantation and can be subsequently removed using laser annealing.
Topley, R.P.
f43e052f-31c2-47a5-a627-3ce44fbc99a1
Martinez-Jimenez, G.
6f3b34dd-33de-42b0-a69d-56e724da239b
O'Faolain, L.
a3225d11-a3e4-47bc-a601-e2dca9020ad3
Healy, N.
26eec85c-8d12-4f21-a67a-022f8dc2daab
Mailis, S.
233e0768-3f8d-430e-8fdf-92e6f4f6a0c4
Thomson, D.J.
17c1626c-2422-42c6-98e0-586ae220bcda
Gardes, F.Y.
7a49fc6d-dade-4099-b016-c60737cb5bb2
Peacock, A.C.
685d924c-ef6b-401b-a0bd-acf1f8e758fc
Payne, D.N.R.
c865ff8d-4639-4bf7-b923-fd61df48d4de
Mashanovich, G.Z.
c806e262-af80-4836-b96f-319425060051
Reed, G.T.
ca08dd60-c072-4d7d-b254-75714d570139
November 2014
Topley, R.P.
f43e052f-31c2-47a5-a627-3ce44fbc99a1
Martinez-Jimenez, G.
6f3b34dd-33de-42b0-a69d-56e724da239b
O'Faolain, L.
a3225d11-a3e4-47bc-a601-e2dca9020ad3
Healy, N.
26eec85c-8d12-4f21-a67a-022f8dc2daab
Mailis, S.
233e0768-3f8d-430e-8fdf-92e6f4f6a0c4
Thomson, D.J.
17c1626c-2422-42c6-98e0-586ae220bcda
Gardes, F.Y.
7a49fc6d-dade-4099-b016-c60737cb5bb2
Peacock, A.C.
685d924c-ef6b-401b-a0bd-acf1f8e758fc
Payne, D.N.R.
c865ff8d-4639-4bf7-b923-fd61df48d4de
Mashanovich, G.Z.
c806e262-af80-4836-b96f-319425060051
Reed, G.T.
ca08dd60-c072-4d7d-b254-75714d570139
Topley, R.P., Martinez-Jimenez, G., O'Faolain, L., Healy, N., Mailis, S., Thomson, D.J., Gardes, F.Y., Peacock, A.C., Payne, D.N.R., Mashanovich, G.Z. and Reed, G.T.
(2014)
Temporary grating coupler structures using localised refractive index engineering.
Asia Communications and Photonics Conference, Shanghai, China.
11 - 14 Nov 2014.
3 pp
.
Record type:
Conference or Workshop Item
(Paper)
Abstract
We demonstrate an erasable grating coupler which allows optical device testing throughout the fabrication process without impairing final circuit performance. Refractive index variation is introduced using ion implantation and can be subsequently removed using laser annealing.
More information
Published date: November 2014
Additional Information:
AW3B.2
Venue - Dates:
Asia Communications and Photonics Conference, Shanghai, China, 2014-11-11 - 2014-11-14
Organisations:
Optoelectronics Research Centre
Identifiers
Local EPrints ID: 378897
URI: http://eprints.soton.ac.uk/id/eprint/378897
PURE UUID: 0ed33148-002a-4317-aab9-c7eeccefcfba
Catalogue record
Date deposited: 10 Jul 2015 15:59
Last modified: 15 Mar 2024 03:40
Export record
Contributors
Author:
R.P. Topley
Author:
G. Martinez-Jimenez
Author:
L. O'Faolain
Author:
N. Healy
Author:
S. Mailis
Author:
D.N.R. Payne
Download statistics
Downloads from ePrints over the past year. Other digital versions may also be available to download e.g. from the publisher's website.
View more statistics