Femtosecond laser-induced patterned transfer of intact semiconductor and polymer thin films via a digital micromirror device
Femtosecond laser-induced patterned transfer of intact semiconductor and polymer thin films via a digital micromirror device
The laser-induced forward transfer (LIFT) of thin films is an attractive technique to deposit materials on a size scale that can span nanometres to millimeters. During LIFT, the energy of a laser pulse is absorbed in a small volume of a thin film (donor) causing an explosive expansion which is used to propel a portion of the donor away from the carrier substrate and transfer it onto a receiver substrate as shown in Fig.1(a). Ultrashort laser systems can limit laser damage to remaining areas of the donor usually present using laser systems with longer (nanosecond) pulse widths.
Feinäugle, M.
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Heath, D.J.
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Mills, B.
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Grant-Jacob, J.A.
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Mashanovich, G.Z.
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Eason, R.W.
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May 2015
Feinäugle, M.
5b631cb4-197f-49db-ab27-352cad7ff656
Heath, D.J.
d53c269d-90d2-41e6-aa63-a03f8f014d21
Mills, B.
05f1886e-96ef-420f-b856-4115f4ab36d0
Grant-Jacob, J.A.
c5d144d8-3c43-4195-8e80-edd96bfda91b
Mashanovich, G.Z.
c806e262-af80-4836-b96f-319425060051
Eason, R.W.
e38684c3-d18c-41b9-a4aa-def67283b020
Feinäugle, M., Heath, D.J., Mills, B., Grant-Jacob, J.A., Mashanovich, G.Z. and Eason, R.W.
(2015)
Femtosecond laser-induced patterned transfer of intact semiconductor and polymer thin films via a digital micromirror device.
16th International Symposium on Laser Precision Microfabrication (part of LAMP2015).
26 - 29 May 2015.
1 pp
.
Record type:
Conference or Workshop Item
(Paper)
Abstract
The laser-induced forward transfer (LIFT) of thin films is an attractive technique to deposit materials on a size scale that can span nanometres to millimeters. During LIFT, the energy of a laser pulse is absorbed in a small volume of a thin film (donor) causing an explosive expansion which is used to propel a portion of the donor away from the carrier substrate and transfer it onto a receiver substrate as shown in Fig.1(a). Ultrashort laser systems can limit laser damage to remaining areas of the donor usually present using laser systems with longer (nanosecond) pulse widths.
More information
Published date: May 2015
Venue - Dates:
16th International Symposium on Laser Precision Microfabrication (part of LAMP2015), 2015-05-26 - 2015-05-29
Organisations:
Optoelectronics Research Centre
Identifiers
Local EPrints ID: 379625
URI: http://eprints.soton.ac.uk/id/eprint/379625
PURE UUID: cd531677-e996-48b2-95be-0823b52f0fd5
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Date deposited: 29 Jul 2015 15:22
Last modified: 15 Mar 2024 03:37
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Contributors
Author:
M. Feinäugle
Author:
D.J. Heath
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