EUV off-axis focusing using a high harmonic source
EUV off-axis focusing using a high harmonic source
High Harmonic Generation is a well established technique for generating Extreme Ultraviolet radiation. It is a promising technique for both structure and spectroscopic imaging due to both the high flux and coherence of the source, and the existence of multiple absorption edges at the generated wavelengths. To increase the flux, a focussing device can be used. Here we present focussing results for a Mo/Si spherical mirror that has been used in an off-axis arrangement, and give extensive analysis of the resulting astigmatic focus and its consequence on diffractive imaging. The astigmatic beam exists as a vertical and horizontal focus, separated by a circle of least confusion. With the help of a theoretical model we show that the most intense part of the beam is always the second line foci and that the phase at the focus is strongly saddle-shaped. However, this phase distortion cannot explain the significant interference peak splitting that is experimentally observed in our diffraction patterns. Instead we propose that the beam quality is degraded upon reflection from the multilayer mirror and it is this asymmetric phase distortion that causes the diffraction peak splitting.
Hudec, René
88957f75-46be-40b4-968b-50b80f6127fd
Mills, B.
05f1886e-96ef-420f-b856-4115f4ab36d0
Rogers, E.T.F.
b92cc8ab-0d91-4b2e-b5c7-8a2f490a36a2
Grant-Jacob, J.
c5d144d8-3c43-4195-8e80-edd96bfda91b
Stebbings, S.L.
aa7b4db4-3297-485f-8caf-1c1c5951eae5
Praeger, M.
84575f28-4530-4f89-9355-9c5b6acc6cac
de Paula, A.M.
834793cd-08ba-4c24-9d74-d8d4d8206867
Froud, C.A.
516351fa-45f9-4566-aa2b-71776e7d5ede
Chapman, R.T.
8a9fe0e2-c408-4188-bf10-e93bf247205c
Butcher, T.J.
bd3117c7-d50c-48d4-8038-76217b1c0570
Brocklesby, W.S.
c53ca2f6-db65-4e19-ad00-eebeb2e6de67
Frey, J.G.
ba60c559-c4af-44f1-87e6-ce69819bf23f
Pina, Ladislav
c4d98634-9463-40fb-b169-75b8c2ae13d4
April 2009
Hudec, René
88957f75-46be-40b4-968b-50b80f6127fd
Mills, B.
05f1886e-96ef-420f-b856-4115f4ab36d0
Rogers, E.T.F.
b92cc8ab-0d91-4b2e-b5c7-8a2f490a36a2
Grant-Jacob, J.
c5d144d8-3c43-4195-8e80-edd96bfda91b
Stebbings, S.L.
aa7b4db4-3297-485f-8caf-1c1c5951eae5
Praeger, M.
84575f28-4530-4f89-9355-9c5b6acc6cac
de Paula, A.M.
834793cd-08ba-4c24-9d74-d8d4d8206867
Froud, C.A.
516351fa-45f9-4566-aa2b-71776e7d5ede
Chapman, R.T.
8a9fe0e2-c408-4188-bf10-e93bf247205c
Butcher, T.J.
bd3117c7-d50c-48d4-8038-76217b1c0570
Brocklesby, W.S.
c53ca2f6-db65-4e19-ad00-eebeb2e6de67
Frey, J.G.
ba60c559-c4af-44f1-87e6-ce69819bf23f
Pina, Ladislav
c4d98634-9463-40fb-b169-75b8c2ae13d4
Hudec, René, Mills, B., Rogers, E.T.F., Grant-Jacob, J., Stebbings, S.L., Praeger, M., de Paula, A.M., Froud, C.A., Chapman, R.T., Butcher, T.J., Brocklesby, W.S., Frey, J.G. and Pina, Ladislav
(2009)
EUV off-axis focusing using a high harmonic source.
SPIE Europe Conference on EUV and X-Ray Optics - Synergy between Laboratory and Space/Optics + Optoelectronics Symposium, Prague, Czech Republic.
20 - 22 Apr 2009.
(doi:10.1117/12.820682).
Record type:
Conference or Workshop Item
(Paper)
Abstract
High Harmonic Generation is a well established technique for generating Extreme Ultraviolet radiation. It is a promising technique for both structure and spectroscopic imaging due to both the high flux and coherence of the source, and the existence of multiple absorption edges at the generated wavelengths. To increase the flux, a focussing device can be used. Here we present focussing results for a Mo/Si spherical mirror that has been used in an off-axis arrangement, and give extensive analysis of the resulting astigmatic focus and its consequence on diffractive imaging. The astigmatic beam exists as a vertical and horizontal focus, separated by a circle of least confusion. With the help of a theoretical model we show that the most intense part of the beam is always the second line foci and that the phase at the focus is strongly saddle-shaped. However, this phase distortion cannot explain the significant interference peak splitting that is experimentally observed in our diffraction patterns. Instead we propose that the beam quality is degraded upon reflection from the multilayer mirror and it is this asymmetric phase distortion that causes the diffraction peak splitting.
Text
BEN MILLS - submitted version.docx
- Accepted Manuscript
More information
Published date: April 2009
Venue - Dates:
SPIE Europe Conference on EUV and X-Ray Optics - Synergy between Laboratory and Space/Optics + Optoelectronics Symposium, Prague, Czech Republic, 2009-04-20 - 2009-04-22
Organisations:
Optoelectronics Research Centre, Computational Systems Chemistry
Identifiers
Local EPrints ID: 348769
URI: http://eprints.soton.ac.uk/id/eprint/348769
PURE UUID: d8a22ed0-8123-4511-aa11-3c5c0c325ada
Catalogue record
Date deposited: 19 Feb 2013 14:08
Last modified: 15 Mar 2024 03:37
Export record
Altmetrics
Contributors
Author:
René Hudec
Author:
E.T.F. Rogers
Author:
S.L. Stebbings
Author:
A.M. de Paula
Author:
C.A. Froud
Author:
R.T. Chapman
Author:
T.J. Butcher
Author:
Ladislav Pina
Download statistics
Downloads from ePrints over the past year. Other digital versions may also be available to download e.g. from the publisher's website.
View more statistics
