Fabrication of macroporous polysilicon by using nanosphere lithography
Fabrication of macroporous polysilicon by using nanosphere lithography
Nanosphere lithography (NSL) has been demonstrated to be a feasible, alternative technique for the fabrication of macroporous polysilicon. The diameter of the pore can be controlled by RIE of the fabricated nanospheres template using Ar/O gas mixtures at pressure of 5mTorr and rf power of 100W.
macroporous polysilicon, nanosphere lithography (NSL)
Chau, C.F.
cebb4b2c-ed4f-4e79-8ab7-56fd05701ecb
Melvin, T.
fd87f5eb-2bb9-48fa-b7be-7100ace9c50f
2007
Chau, C.F.
cebb4b2c-ed4f-4e79-8ab7-56fd05701ecb
Melvin, T.
fd87f5eb-2bb9-48fa-b7be-7100ace9c50f
Chau, C.F. and Melvin, T.
(2007)
Fabrication of macroporous polysilicon by using nanosphere lithography.
18th Workshop on Micromachining, Micromechanics and Microsystems (MME 2007), Guimaraes, Portugal.
16 - 18 Sep 2007.
4 pp
.
Record type:
Conference or Workshop Item
(Paper)
Abstract
Nanosphere lithography (NSL) has been demonstrated to be a feasible, alternative technique for the fabrication of macroporous polysilicon. The diameter of the pore can be controlled by RIE of the fabricated nanospheres template using Ar/O gas mixtures at pressure of 5mTorr and rf power of 100W.
Text
3941.pdf
- Author's Original
More information
Published date: 2007
Venue - Dates:
18th Workshop on Micromachining, Micromechanics and Microsystems (MME 2007), Guimaraes, Portugal, 2007-09-16 - 2007-09-18
Keywords:
macroporous polysilicon, nanosphere lithography (NSL)
Identifiers
Local EPrints ID: 49794
URI: http://eprints.soton.ac.uk/id/eprint/49794
PURE UUID: 89daf6dd-d010-4feb-a746-ac84e5c34252
Catalogue record
Date deposited: 04 Dec 2007
Last modified: 15 Mar 2024 09:59
Export record
Contributors
Author:
C.F. Chau
Download statistics
Downloads from ePrints over the past year. Other digital versions may also be available to download e.g. from the publisher's website.
View more statistics