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Chemical modification and micropatterning of Si(100) with oligonucleotides

H.B.Yina, T.Brownb, R.Greefb, J.S.Wilkinsonc, T.Melvina

a. Department of Electronics and Computer Science, University of Southampton, UK
b. Department of Chemistry, University of Southampton, UK
c. Optoelectronics Research Centre, University of Southampton, UK

Abstract

A method for the reliable attachment of oligonucleotides to silicon (1 0 0) surfaces in patterns is described. UV light exposure of silicon (1 0 0) coated with alkenes functionalized with carboxylic acid groups and derivatives results in covalent attachment to the silicon surface. The carboxyl-terminated (and derivatives) surfaces act as a substrate for the chemistry of the subsequent attachment of oligonucleotides. Illustrated are our results gained for optimisation of the surface attachment chemistry and the characterisation of the surface with scanning electron microscopy, epifluorescence microscopy and ellipsometry.


Microelectronic Engineering (2004) Vol.73-4 pp.830-836

doi: 10.1016/j.mee.2004.03.060

Southampton ePrint id: 20345

 

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Copyright University of Southampton 2006