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Laser-assisted microstructuring for Ti:sapphire channel-waveguide fabrication
A.Crunteanu, Markus Pollnau, G.Jänchen, C.Hibert, Patrik Hoffmann, and Rene-Paul Salathé
Swiss Federal Institute of Technology, Switzerland
Robert W.Eason and David P.Shepherd
Optoelectronics Research centre, University of Southampton, UK
Abstract
We report on the fabrication of Ti:sapphire channel waveguides. Such channel waveguides are of interest, e.g., as low-threshold tunable lasers. We investigated several structuring methods including ion beam implantation followed by wet chemical etching strip loading by polyimide spin coating and subsequent laser micro-machining, direct laser ablation or reactive ion etching through laser-structured polyimide contact masks. The later two methods result in ribs having different widths and heights up to ~5 μm. By reactive ion etching we have obtained channel waveguides with strong confinement of the Ti:sapphire fluorescence emission.
International Conference on Advanced Laser Technologies (ALT '02 ) Adelboden, Switzerland 15-20 Sep (2002)(5147) pp.363-369
doi: 10.1117/12.543706
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Copyright University of Southampton 2006