Direct UV writing of channel waveguides and Bragg grating structures
Direct UV writing of channel waveguides and Bragg grating structures
Direct UV writing is a dynamic planar lightwave circuit fabrication technique offering great potential as a means of rapid prototyping and small/medium batch fabrication. The technique is based on the refractive index increase of photosensitive glasses through exposure to ultraviolet light. In this case, a beam is tightly focused to create a writing spot in the order of microns and is translated relative to the sample. It is this translation over a 2-d plane that defines the channel waveguide structures; there is no need for a photolithographic mask or subsequent processing. This process has previously been shown to be a versatile system producing good quality, low loss waveguides compatible with existing silica based telecom fibres.
Emmerson, G.D.
89517051-daed-4f8e-aca6-f686d8c54e7c
Gawith, C.B.E.
926665c0-84c7-4a1d-ae19-ee6d7d14c43e
Williams, R.B.
1d172577-abdb-4589-8ded-153cf6732c20
Smith, P.G.R.
8979668a-8b7a-4838-9a74-1a7cfc6665f6
2003
Emmerson, G.D.
89517051-daed-4f8e-aca6-f686d8c54e7c
Gawith, C.B.E.
926665c0-84c7-4a1d-ae19-ee6d7d14c43e
Williams, R.B.
1d172577-abdb-4589-8ded-153cf6732c20
Smith, P.G.R.
8979668a-8b7a-4838-9a74-1a7cfc6665f6
Emmerson, G.D., Gawith, C.B.E., Williams, R.B. and Smith, P.G.R.
(2003)
Direct UV writing of channel waveguides and Bragg grating structures.
Rank Prize Funds Minisymposium: Passive Optical Components, Grasmere, UK.
16 - 19 Jun 2003.
1 pp
.
Record type:
Conference or Workshop Item
(Paper)
Abstract
Direct UV writing is a dynamic planar lightwave circuit fabrication technique offering great potential as a means of rapid prototyping and small/medium batch fabrication. The technique is based on the refractive index increase of photosensitive glasses through exposure to ultraviolet light. In this case, a beam is tightly focused to create a writing spot in the order of microns and is translated relative to the sample. It is this translation over a 2-d plane that defines the channel waveguide structures; there is no need for a photolithographic mask or subsequent processing. This process has previously been shown to be a versatile system producing good quality, low loss waveguides compatible with existing silica based telecom fibres.
More information
Published date: 2003
Additional Information:
Winner of best presentation award
Venue - Dates:
Rank Prize Funds Minisymposium: Passive Optical Components, Grasmere, UK, 2003-06-16 - 2003-06-19
Identifiers
Local EPrints ID: 41598
URI: http://eprints.soton.ac.uk/id/eprint/41598
PURE UUID: f2c900fa-64ce-462e-b814-6072c3fd1b0d
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Date deposited: 05 Oct 2006
Last modified: 16 Mar 2024 03:12
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Contributors
Author:
G.D. Emmerson
Author:
R.B. Williams
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