| Publication No: 2302 | Search all ORC publications |
Ti:sapphire rib channel waveguide fabricated by reactive ion etching of a planar waveguide
A.Crunteanu, G.Jänchen, R.P.Salathé, P.Hoffmann, and M.Pollnau,
Institute of Applied Optics, Department of Microtechnique, Swiss Federal Institute of Technology, CH-1015 Lausanne, Switzerland
R.W.Eason and D.P.Shepherd
Optoelectronics Research Centre, University of Southampton, UK
Abstract
We were successful in creating 1.4μm high ribs in a Ti:Sapphire planar waveguide by reactive ion etching. Optical investigations of the obtained structure showed channel-waveguide fluorescence emission of the Ti:sapphire layer after Ar-ion excitation.
CLEO 2002 Long Beach, California 19-24 May (2002)
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Copyright University of Southampton 2006