Ablated gratings on borosilicate glass by 193nm excimer laser radiation

Abstract

Relief gratings of 500nm period have been fabricated on Er/Yb-doped borosilicate glass substrates by laser ablation using an excimer laser at a wavelength of 193nm and a modified Mach-Zehnder interferometer. The grating fabrication process has been quantified using diffraction efficiency measurements and atomic force microscope microscans, and related to the incident energy density.

Applied Physics A: Supplement S (1999) Vol.69(7) pp.739-741

doi: 10.1007/s003399900244

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