Speaker: Chris Holmes
Date: 17 February 2010
Time: 2pm
Venue: B53 ORC Seminar Room
Abstract:
Direct UV Grating Writing is a method for defining buried waveguides and Bragg gratings in planar glass substrates. The technique requires a photosensitivity core layer, in which waveguides can be defined when exposed to UV radiation. A dual beam UV writing system allows the simultaneous definition of Bragg gratings and waveguide structures, in one simple step process. The structures that result have a wide range of potential applications, which including chemical and physical sensors and telecommunication components. Direct UV written components with potential sensing and telecommunication applications shall be explored. The reported devices have been fabricated in a silica-on-silicon platform and have exploited a combination of direct grating writing, wet etching, micromachining and sputtering processes.