FEI Helios NanoLab DualBeam FIB/SEM

Allows focused ion beam milling, electron-beam lithography and ion/electron beam-induced deposition, with parallel high resolution
 imaging, for the production of complex nanostructures in a broad 
range of materials
.

Specifications:

  • 0.9 nm electron beam and 5 nm ion 
    beam resolution
  • Gas injection for beam-induced deposition 
    of gold and platinum
  • Nabity pattern generator
  • Electron-beam lithography capability
  • Kleindiek nanomanipulator for TEM sample
    lift-out (other tool options available inc. microfluidic 
    injection and four-point electrical probe)
  • 5-axis motorized stage for samples up to 150mm dia.
    (larger without full rotation) and 20 mm thick.
  • Ability to accept complex CAD pattern files

Copyright University of Southampton 2006