FEI Helios NanoLab DualBeam FIB/SEM

Allows focused ion beam milling, electron-beam lithography and ion/electron beam-induced deposition, with parallel high resolution
 imaging, for the production of complex nanostructures in a broad 
range of materials.

Specifications:

• 0.9 nm electron beam and 5 nm ion 
  beam resolution
• Gas injection for beam-induced deposition 
  of gold and platinum
• Nabity pattern generator
• Electron-beam lithography capability
• Kleindiek nanomanipulator for TEM sample
  lift-out (other tool options available inc. microfluidic 
  injection and four-point electrical probe)
• 5-axis motorized stage for samples up to 150mm dia.
  (larger without full rotation) and 20 mm thick.
• Ability to accept complex CAD pattern files